The Nanoscribe system is a laser lithography system allowing 3D printing of true 3-dimensional microscale and nanoscale based on two photon polymerization in UV-curable photoresists. The system can utilize specifically designed IP-photoresists optimized for 3D microfabrication, but can also employ custom polymers developed by the user. The direct laser writing technology is a powerful platform for a wide variety of high-impact applications of direct interest to Clark School faculty including micro-optics and photonics, opto-electronics, energy systems, sensors, material research, and nanotechnologies for the life sciences. The system enables micro/nano structures that are impossible to realize using traditional photolithography or other patterning methods.
There are three main objectives that the machine is capable of printing in, with their specifications detailed below.
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Further Documentation for the machine is available at https://dozuki.umd.edu/c/Nanoscribe
Available Resins: IP-Q, IP-PDMS, IP-S, IP-Visio, IP-G, and IP-DIP2
Printing Technology | 2 Photon Polymerization |
Minimum XY Feature Size | 160 nm |
Finest XY Resolution | 400 nm |
Finest Vertical Resolution | 1000 nm |
Layer Distance | 0.1-5.0 μm |
Maximum Object Height | 8mm |
Objective | Working Distance | Print Field |
63x Objective | 360 μm | 200 μm |
25x Objective | 380 μm | 400 μm |
10x Objective | 700 μm | 1000 μm |
More specific questions on specific print parameters can be inquired upon by emailing terrapinworks@umd.edu
$25/hr for setup and post processing
$35/hr for print time (includes material cost)
DeScribe, NanoWrite
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