Nanoscribe Photonic Professional GT+

The Nanoscribe system is a laser lithography system allowing 3D printing of true 3-dimensional microscale and nanoscale based on two photon polymerization in UV-curable photoresists. The system can utilize specifically designed IP-photoresists optimized for 3D microfabrication, but can also employ custom polymers developed by the user. The direct laser writing technology is a powerful platform for a wide variety of high-impact applications of direct interest to Clark School faculty including micro-optics and photonics, opto-electronics, energy systems, sensors, material research, and nanotechnologies for the life sciences. The system enables micro/nano structures that are impossible to realize using traditional photolithography or other patterning methods.

There are three main objectives that the machine is capable of printing in, with their specifications detailed below.

Objective	10x	25x	63x
Working Distance	700 um	380 um	360 um
Print Field Size	1000 um	400 um	200 um
Application	Rapid Prototyping	Medium sized features	High precision features
Typical Slicing Distance	5 um	1 um	0.3 um
Typical Hatching Distance	1 um	0.5 um	0.2 um
Max Volume	400 mm^3	50 mm^3	0.1 mm^3
Print Time	6.8 mm^3/h	0.8 mm^3/h	0.4 mm^3/h
Voxel	1.2 um	0.6 um	0.2 um