The Nanoscribe system is a laser lithography system allowing 3D printing of true 3-dimensional microscale and nanoscale based on two photon polymerization in UV-curable photoresists. The system can utilize specifically designed IP-photoresists optimized for 3D microfabrication, but can also employ custom polymers developed by the user. The direct laser writing technology is a powerful platform for a wide variety of high-impact applications of direct interest to Clark School faculty including micro-optics and photonics, opto-electronics, energy systems, sensors, material research, and nanotechnologies for the life sciences. The system enables micro/nano structures that are impossible to realize using traditional photolithography or other patterning methods.
Documentation for the machine is available at https://dozuki.umd.edu/c/Nanoscribe
Detailed Materials:
Available Resins: IP-Q, IP-PDMS, IP-S, IP-Visio, IP-G, and IP-DIP2
| Printing Technology | 2 Photon Polymerization |
| Minimum XY Feature Size | 160 nm |
| Finest XY Resolution | 400 nm |
| Finest Vertical Resolution | 1000 nm |
| Layer Distance | 0.1-5.0 μm |
| Maximum Object Height | 8mm |
| Objective | Working Distance | Print Field |
| 63x Objective | 360 μm | 200 μm |
| 25x Objective | 380 μm | 400 μm |
| 10x Objective | 700 μm | 1000 μm |
More specific questions on specific print parameters can be inquired upon by emailing terrapinworks@umd.edu
Usage Pricing:
$25/hr for setup and post processing
$35/hr for print time (includes material cost)
Manufacturer URL:
Software Used:
DeScribe, NanoWrite
Sample Parts:
Location:
Technology Type:
Status:
Service(s):
Advanced 3D Printing
Research Equipment
Training
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